Differences
This shows you the differences between two versions of the page.
Both sides previous revisionPrevious revisionNext revision | Previous revision | ||
substrate:start [2020/07/01 09:20] – janet | substrate:start [2020/07/03 11:31] (current) – [Cleaving Substrates] janet | ||
---|---|---|---|
Line 52: | Line 52: | ||
FIXME more ... | FIXME more ... | ||
- | ====== Si: Cleaning Procedures that remove the native oxide ====== | + | ===== Si: Cleaning Procedures that remove the native oxide ===== |
This section details some wisdom about cleaning of Si surfaces for the purpose of remove oxides to study reconstructed surfaces or to passivate them. | This section details some wisdom about cleaning of Si surfaces for the purpose of remove oxides to study reconstructed surfaces or to passivate them. | ||
Line 101: | Line 101: | ||
- | ===== Cleaving Substrates ===== | + | ====== Cleaving Substrates |
It is often necessary to cut a substrate or substrate + film into smaller pieces, a process called cleaving. It is easiest to cleave single-crystal substrates along directions that coincide with the major lattice planes, e.g. [100] silicon. Such breaks are typically very clean. Cleaving along random directions is harder. | It is often necessary to cut a substrate or substrate + film into smaller pieces, a process called cleaving. It is easiest to cleave single-crystal substrates along directions that coincide with the major lattice planes, e.g. [100] silicon. Such breaks are typically very clean. Cleaving along random directions is harder. | ||
+ | |||
+ | Always scribe on the NON-film side of the substrate. Put the film side on a clean, soft, preferably lint-free cloth. | ||
This video from Okan Agirseven describes cleaving an amorphous SiO2 substrate in the Tate lab: | This video from Okan Agirseven describes cleaving an amorphous SiO2 substrate in the Tate lab: | ||
Line 116: | Line 118: | ||
This description of the {{ : | This description of the {{ : | ||
- | + | University Wafer has a [[https:// |