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mask:start [2012/08/07 16:37] – rivermask:start [2020/03/06 09:04] (current) – external edit 127.0.0.1
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 Photolithography masks can be created via a laser writing tool (also in the cleanroom). Smallest feature size is approximately 500 nm. Chrome/Quartz mask blanks run approximately $60. Laser time costs money due to the finite life of the tool and the cost of laser gas. Direct write lithography is also available.  Photolithography masks can be created via a laser writing tool (also in the cleanroom). Smallest feature size is approximately 500 nm. Chrome/Quartz mask blanks run approximately $60. Laser time costs money due to the finite life of the tool and the cost of laser gas. Direct write lithography is also available. 
  
-[[http://www.microchemicals.eu/technical_information/TroubleShooter_EN.pdf|Lithography Troubleshooter - Microchemicals 2012]]+[[http://www.microchemicals.eu/technical_information/TroubleShooter_EN.pdf|Lithography Troubleshooter - Microchemicals (2012)]]
  
 ====== Shadow Masks ====== ====== Shadow Masks ======

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