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--- mask:start [2011/07/26 13:36] – janet
+++ mask:start [2020/03/06 09:04] (current) – external edit 127.0.0.1
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+====== Photolithography ======
+The ECE Cleanroom in Owen has a mask aligner and photolithography processing stations available for use. Proper training must be received prior to using the equipment (see Chris Tasker).
+Photolithography masks can be created via a laser writing tool (also in the cleanroom). Smallest feature size is approximately 500 nm. Chrome/Quartz mask blanks run approximately $60. Laser time costs money due to the finite life of the tool and the cost of laser gas. Direct write lithography is also available.
+[[http://www.microchemicals.eu/technical_information/TroubleShooter_EN.pdf|Lithography Troubleshooter - Microchemicals (2012)]]
 ====== Shadow Masks ======
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