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| mask:start [2011/07/25 14:49] – jack is gone from MBI. You can contact Todd instead. jason | mask:start [2020/03/06 09:04] (current) – external edit 127.0.0.1 | ||
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| + | ====== Photolithography ====== | ||
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| + | The ECE Cleanroom in Owen has a mask aligner and photolithography processing stations available for use. Proper training must be received prior to using the equipment (see Chris Tasker). | ||
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| + | Photolithography masks can be created via a laser writing tool (also in the cleanroom). Smallest feature size is approximately 500 nm. Chrome/ | ||
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| + | [[http:// | ||
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| ====== Shadow Masks ====== | ====== Shadow Masks ====== | ||
| - | Shadow masks for depositing films and wires have been made with the help of Todd Miller (rtm at oregon state dot edu) at the [[http:// | + | Shadow masks for depositing films and wires have been made with the help of Todd Miller (rtm at oregon state dot edu) at the [[http:// |
| We have created masks out of 50um 304SS flat shim stock and 75um 316SS shim stock. Other materials are available for use. Drawings should be made in a CAD program that can export to DXF (SolidWorks, | We have created masks out of 50um 304SS flat shim stock and 75um 316SS shim stock. Other materials are available for use. Drawings should be made in a CAD program that can export to DXF (SolidWorks, | ||
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