Differences
This shows you the differences between two versions of the page.
Both sides previous revisionPrevious revisionNext revision | Previous revision | ||
mask:start [2011/05/17 22:52] – janet | mask:start [2020/03/06 09:04] (current) – external edit 127.0.0.1 | ||
---|---|---|---|
Line 1: | Line 1: | ||
+ | ====== Photolithography ====== | ||
+ | |||
+ | The ECE Cleanroom in Owen has a mask aligner and photolithography processing stations available for use. Proper training must be received prior to using the equipment (see Chris Tasker). | ||
+ | |||
+ | Photolithography masks can be created via a laser writing tool (also in the cleanroom). Smallest feature size is approximately 500 nm. Chrome/ | ||
+ | |||
+ | [[http:// | ||
+ | |||
====== Shadow Masks ====== | ====== Shadow Masks ====== | ||
- | Shadow masks for depositing films and wires have been made with the help of Jack Rundel | + | Shadow masks for depositing films and wires have been made with the help of Todd Miller |
- | We have created masks out of 50um 304SS flat shim stock and 75um 316SS shim stock. Other materials are available for use. | + | We have created masks out of 50um 304SS flat shim stock and 75um 316SS shim stock. Other materials are available for use. Drawings should be made in a CAD program that can export to DXF (SolidWorks, |
The tool used to cut the masks is the ESI5330 UV Laser Drill. The cutting path of the drill is controlled by relatively simple "G code." [[http:// | The tool used to cut the masks is the ESI5330 UV Laser Drill. The cutting path of the drill is controlled by relatively simple "G code." [[http:// | ||
Line 118: | Line 126: | ||
</ | </ | ||
- |