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+ | ====== Photolithography ====== | ||
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+ | The ECE Cleanroom in Owen has a mask aligner and photolithography processing stations available for use. Proper training must be received prior to using the equipment (see Chris Tasker). | ||
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+ | Photolithography masks can be created via a laser writing tool (also in the cleanroom). Smallest feature size is approximately 500 nm. Chrome/ | ||
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+ | [[http:// | ||
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====== Shadow Masks ====== | ====== Shadow Masks ====== | ||
- | Shadow masks for depositing films and wires have been made with the help of Jack Rundel | + | Shadow masks for depositing films and wires have been made with the help of Todd Miller |
- | We have created masks out of 50um 304SS flat shim stock and 75um 316SS shim stock. Other materials are available for use. | + | We have created masks out of 50um 304SS flat shim stock and 75um 316SS shim stock. Other materials are available for use. Drawings should be made in a CAD program that can export to DXF (SolidWorks, |
- | The tool used to cut the masks is the ESI5330 UV Laser Drill. The cutting path of the drill is controlled by relatively simple "G code." SolidWorks can be used to create more complex models that can be converted into G code at MBI. Guest workstations with SolidWorks and other programs are available for use. Jack has a great {{: | + | The tool used to cut the masks is the ESI5330 UV Laser Drill. The cutting path of the drill is controlled by relatively simple "G code." |
For the shim stock, the average line width is about 50um, although 20um lines have been achieved. | For the shim stock, the average line width is about 50um, although 20um lines have been achieved. | ||
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