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mask:start [2011/04/14 00:30] – rivermask:start [2020/03/06 09:04] (current) – external edit 127.0.0.1
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-====== G Code for the ESI5330 Laser Cutter ======+====== Photolithography ====== 
 + 
 +The ECE Cleanroom in Owen has a mask aligner and photolithography processing stations available for use. Proper training must be received prior to using the equipment (see Chris Tasker).  
 + 
 +Photolithography masks can be created via a laser writing tool (also in the cleanroom). Smallest feature size is approximately 500 nm. Chrome/Quartz mask blanks run approximately $60. Laser time costs money due to the finite life of the tool and the cost of laser gas. Direct write lithography is also available.  
 + 
 +[[http://www.microchemicals.eu/technical_information/TroubleShooter_EN.pdf|Lithography Troubleshooter - Microchemicals (2012)]] 
 + 
 +====== Shadow Masks ====== 
 + 
 +Shadow masks for depositing films and wires have been made with the help of Todd Miller (rtm at oregon state dot edu) at the [[http://mbi-online.org/|MBI]] (Microproducts Breakthrough Institute on HP campus).  Pre-2011 was Jack Rundel, who has left MBI. 
 + 
 +We have created masks out of 50um 304SS flat shim stock and 75um 316SS shim stock. Other materials are available for use.  Drawings should be made in a CAD program that can export to DXF (SolidWorks, AutoCAD, etc); one free option is DraftSight, a 2-D program from the makers of SolidWorks. 
 + 
 +The tool used to cut the masks is the ESI5330 UV Laser Drill. The cutting path of the drill is controlled by relatively simple "G code." [[http://www.solidworks.com/|SolidWorks]] can be used to create more complex models that can be converted into G code at MBI. Guest workstations with SolidWorks and other programs are available for use. Jack has a great {{:mask:importing_part_from_solidworks_to_smartcam_08-2010.pdf|step by step guide}} on how to properly export the models and get the data to the drill.  
 + 
 +For the shim stock, the average line width is about 50um, although 20um lines have been achieved.  
 + 
 +===== G Code for the ESI5330 ===== 
  
 Example G code that describes a 10mm square within a 30mm square. All coordinates are shown in micron units. The internal features cut first. The part perimeter cuts last. Example G code that describes a 10mm square within a 30mm square. All coordinates are shown in micron units. The internal features cut first. The part perimeter cuts last.
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 "G1" = move to this point while cutting "G1" = move to this point while cutting
  
-<pre>+<code>
 % %
 (ESI5330) (ESI5330)
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    X0.0    X0.0
    Y0.0    Y0.0
 +P1
 +%
 +</code>
 +
 +The following is the G code for an example of a shadow mask made for 3-omega measurements. 
 +
 +<code>
 +
 +%
 +(ESI5330)
 +T1 6
 +T0 221
 +
 +
 +P0
 +
 +G0 X3000.0 Y1960.0
 +G1 Y2000.0
 + Y4000.0
 + X5000.0
 + Y2000.0
 + X5980.0
 + Y10000.0
 + X5000.0
 + Y8000.0
 + X3000.0
 + Y10000.0
 + Y10040.0
 + X9000.0
 + Y10000.0
 + Y8000.0
 + X7000.0
 + Y10000.0
 + X6000.0
 + Y2000.0
 + X7000.0
 + Y4000.0
 + X9000.0
 + Y2000.0
 + Y1960.0
 + X3000.0
 +
 +
 +G0 X9500.0 Y6000.0
 +G3 I9000.0 J6000.0
 +
 +
 +G0 X7500.0
 +G3 I7000.0 J6000.0
 +
 +
 +G0 X5500.0
 +G3 I5000.0 J6000.0
 +
 +
 +G0 X3500.0
 +G3 I3000.0 J6000.0
 +
 +P1
 +
 +P0
 +
 +G0 X12000.0 Y0.0
 +G1 X0.0
 +
 +G0 X12000.0 Y12000.0
 +G1 Y0.0
 +
 +
 +G0 X0.0 Y12000.0
 +G1 X12000.0
 +
 +G0 X0.0 Y0.0
 +G1 Y12000.0
 +
 P1 P1
 % %
  
-</pre>+</code>

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