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substrate:start [2020/07/01 09:31] janetsubstrate:start [2020/07/03 11:31] (current) – [Cleaving Substrates] janet
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-====== Si: Cleaning Procedures that remove the native oxide ======+===== Si: Cleaning Procedures that remove the native oxide =====
  
 This section details some wisdom about cleaning of Si surfaces for the purpose of remove oxides to study reconstructed surfaces or to passivate them. This section details some wisdom about cleaning of Si surfaces for the purpose of remove oxides to study reconstructed surfaces or to passivate them.
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 ====== Cleaving Substrates ====== ====== Cleaving Substrates ======
 It is often necessary to cut a substrate or substrate + film into smaller pieces, a process called cleaving. It is easiest to cleave single-crystal substrates along directions that coincide with the major lattice planes, e.g. [100] silicon. Such breaks are typically very clean. Cleaving along random directions is harder.  Amorphous substrates like glass can also be cleaved, and the edge tends to be less straight, but you get better with practice.  It all depends on the pressure of that single scribe. It is often necessary to cut a substrate or substrate + film into smaller pieces, a process called cleaving. It is easiest to cleave single-crystal substrates along directions that coincide with the major lattice planes, e.g. [100] silicon. Such breaks are typically very clean. Cleaving along random directions is harder.  Amorphous substrates like glass can also be cleaved, and the edge tends to be less straight, but you get better with practice.  It all depends on the pressure of that single scribe.
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 +Always scribe on the NON-film side of the substrate. Put the film side on a clean, soft, preferably lint-free cloth.
  
 This video from Okan Agirseven describes cleaving an amorphous SiO2 substrate in the Tate lab:  This video from Okan Agirseven describes cleaving an amorphous SiO2 substrate in the Tate lab: 

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