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mask:start [2011/07/25 14:49] – jack is gone from MBI. You can contact Todd instead. jasonmask:start [2020/03/06 09:04] (current) – external edit 127.0.0.1
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 +====== Photolithography ======
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 +The ECE Cleanroom in Owen has a mask aligner and photolithography processing stations available for use. Proper training must be received prior to using the equipment (see Chris Tasker). 
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 +Photolithography masks can be created via a laser writing tool (also in the cleanroom). Smallest feature size is approximately 500 nm. Chrome/Quartz mask blanks run approximately $60. Laser time costs money due to the finite life of the tool and the cost of laser gas. Direct write lithography is also available. 
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 +[[http://www.microchemicals.eu/technical_information/TroubleShooter_EN.pdf|Lithography Troubleshooter - Microchemicals (2012)]]
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 ====== Shadow Masks ====== ====== Shadow Masks ======
  
-Shadow masks for depositing films and wires have been made with the help of Todd Miller (rtm at oregon state dot edu) at the [[http://mbi-online.org/|MBI]] (Microproducts Breakthrough Institute on HP campus).+Shadow masks for depositing films and wires have been made with the help of Todd Miller (rtm at oregon state dot edu) at the [[http://mbi-online.org/|MBI]] (Microproducts Breakthrough Institute on HP campus).  Pre-2011 was Jack Rundel, who has left MBI.
  
 We have created masks out of 50um 304SS flat shim stock and 75um 316SS shim stock. Other materials are available for use.  Drawings should be made in a CAD program that can export to DXF (SolidWorks, AutoCAD, etc); one free option is DraftSight, a 2-D program from the makers of SolidWorks. We have created masks out of 50um 304SS flat shim stock and 75um 316SS shim stock. Other materials are available for use.  Drawings should be made in a CAD program that can export to DXF (SolidWorks, AutoCAD, etc); one free option is DraftSight, a 2-D program from the makers of SolidWorks.
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