ICP-AES Analysis of Cu Diffusion From Cu (HCO2)2 Into HafSOx Thin Films. Jeff Wong; Ripley Yates; Liecong Zhen. 2006.
Abstract
In this preliminary exploration into thin film diffusion, an attempt at correlation the copper concentration of the initial HafSOx precursor solution on interdiffusion of copper from a Cu(HCO2)2 layer was made, 0, 0.15, and 0.30 mole fraction Cu to metal initial precursor concentrations were used. ICP-AES was used to analyze the Cu diffusion from the Cu(HCO2)2. Due to limiting time, only two duplicates of each sample were made and only one of each 0% solution were run. This resulted in the following measurements:
|
Xcu in Precursor |
Cu Diff |
+/- |
|
|
(ng/mL) |
(ng/mL) |
|
0 |
154.9 |
35.0 |
|
0.15 |
305.7 |
127.0 |
|
0.3 |
333.2 |
72.0 |
The large error margin on the middle sample ruled out a linear regression and therefore most of the results’ significance. Our results showed that the Cu concentrations increased in the HafSOx precursor, the diffusion of Cu from the Cu(HCO2)2 increased as well. This experiment is still useful as a preliminary look at how such an experiment could work with a larger number of samples and duplicates as well as establishing that there is at least some reliance on initial solution copper concentration.